Wet Chemical Damage Free In-Ga-Zn-O TFT Processing White Paper
Selective etching of the source/drain metal can be increased substantially by using SACHEM’s proprietary formulations. The use of an etch stop layer to protect the IGZO channel is therefore not required, allowing for cost-effective TFT processing.
Use SACHEM''s formulation without an etch stop layer
- Etch S/D metal
- Non-etch IGZO
- High selectivity